<instructions>Your goal is to analyze the following comment and estimate how highly it will be upvoted by the Hacker News community.</instructions><comment><author>chc4</author><text>If you&amp;#x27;re interested in chip fabrication, I heartily recommend watching &lt;a href=&quot;https:&amp;#x2F;&amp;#x2F;youtu.be&amp;#x2F;NGFhc8R_uO4&quot; rel=&quot;nofollow&quot;&gt;https:&amp;#x2F;&amp;#x2F;youtu.be&amp;#x2F;NGFhc8R_uO4&lt;/a&gt; - it goes over the evolution of how they make transistors all the way up to 2009 state of the art, with a follow up talk in 2013 (&lt;a href=&quot;https:&amp;#x2F;&amp;#x2F;youtu.be&amp;#x2F;KL-I3-C-KBk&quot; rel=&quot;nofollow&quot;&gt;https:&amp;#x2F;&amp;#x2F;youtu.be&amp;#x2F;KL-I3-C-KBk&lt;/a&gt;).&lt;p&gt;Both of them mention how Intel is sinking billions of dollars into ASML to try and get this process working, and how impossible everyone thinks it is, so I&amp;#x27;m skeptical that they finally got everything squared away now :)</text><parent_chain></parent_chain></comment><story><title>Tin Plasma Extreme Ultraviolet Radiation Makes 5nm Integrated Circuits Possible</title><url>https://www.trumpf.com/en_US/applications/euv-lithography/</url></story>
<instructions>Your goal is to analyze the following comment and estimate how highly it will be upvoted by the Hacker News community.</instructions><comment><author>baybal2</author><text>A tidbit, a one of more lunatical proposal for the next gen fab design is to build it around a multimegawatt cyclotron, and have the light source problem &amp;quot;solved for good&amp;quot;&lt;p&gt;The genuine problem with tin plasma laser is its power efficiency. An early adopter runs can bare with 0.02% energy efficiency, but imagine, say, a few 20 line fabs and their power consumption.&lt;p&gt;Another very important advantage of this design would be getting a more stable, easily tunable, and more narrowband light source. Tin plasma has around 1nm deviation in its spectrum, while a cyclotron can get to picometres on an arbitrary wavelength.&lt;p&gt;And with all above, you get a supremely tempting option to try diffractive optics, and do away with all geometry imposes nonsense of EUV reflective optics...</text><parent_chain></parent_chain></comment><story><title>Tin Plasma Extreme Ultraviolet Radiation Makes 5nm Integrated Circuits Possible</title><url>https://www.trumpf.com/en_US/applications/euv-lithography/</url></story>